It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will support advanced Logic and Memory chip production.

Aug 8, 2025 · EUV lithography machines use short-wavelength light to create extremely fine patterns on silicon wafers. They enable smaller transistors, higher chip density, and improved …

Since extreme ultraviolet light is absorbed by all materials – including air, ZEISS SMT created an optical system for the EUV lithography machine. This operates in the vacuum chamber and is …

Jun 26, 2023 · IBM Research used one of the first EUV machines in the world, located at Albany Nanotech, to accelerate EUV lithography development for production use. This allowed IBM to …

Dec 18, 2025 · China has reverse-engineered an EUV machine, marking major step toward chip self-sufficiency Secretive project brings Beijing closer to semiconductor independence, once …

Sep 2, 2025 · Learn how EUV lithography uses extreme ultraviolet light and magnetic levitation to create the microchips powering modern electronics.

Beginning with an overview of the fundamental principles of photolithography, the main components and functionalities of EUV scanners are described. It also covers exposure tools …

Aug 19, 2025 · EUV lithography is a crucial enabler for the continued scaling of semiconductors, often seen as the driving force behind Moore’s Law. By allowing for smaller feature sizes, EUV …

Dec 19, 2025 · China has reportedly built an extreme‑ultraviolet (EUV) lithography machine inside a high‑security laboratory in Shenzhen, in what sources described as a nationally coordinated …